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Controlled growth of hexagonal GaN pyramids by hot-wall MOCVD

机译:通过热壁MOCVD控制六角形GaN金字塔的生长

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摘要

Hexagonal GaN pyramids have been fabricated by hot-wall metal organic chemical vapor deposition (hot-wall MOCVD) and the growth evolution have been studied. It was concluded that the pyramid growth can be divided into two regimes separated by the adsorption kinetics of the {1101} surfaces of the pyramids. In the adsorption regime, the pyramids grow simultaneously in the <1101> and [0001] -directions. In the zero-adsorption regime the pyramids grow only in the [0001] direction. Thus the pyramid growth ceases when the (0001) facet growth has been terminated. Large arrays consisting of highly uniform pyramids with apex radii of 3 nm or less were achieved in the zeroadsorption regime. The growth-regime type was concluded to have a large impact on the uniformity degradation of the pyramids, and their optical properties. The impacts of threading dislocations which enter the pyramid from underneath are also discussed.
机译:通过热壁金属有机化学气相沉积(热壁MOCVD)制备了六方氮化镓金字塔,并研究了其生长演化。得出的结论是,金字塔的生长可以分为两种状态,由金字塔的{1101}表面的吸附动力学分开。在吸附方式中,棱锥同时在<1101>和[0001]方向上生长。在零吸附状态下,金字塔仅沿[0001]方向生长。因此,当(0001)小面增长已终止时,金字塔增长停止。在零吸收方案中,获得了由高度均匀的金字塔组成的大型阵列,其顶点半径为3 nm或更小。得出结论,增长方式类型对金字塔的均匀性退化及其光学性能有很大影响。还讨论了从下方进入金字塔的螺纹错位的影响。

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